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RecordNumber
3652
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Author
Bedn�a�r, B
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Uni. Title
Litografick�e technikyEnglish
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Title
Resists in microlithography and printing
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Author Statement
Bohumil Bedn�a�r, Jaroslav Kr�al�i�cek, and Jarom�ir Zachoval ; with contributions by Andrey V. Yelcov and Tatyana A. Yurre.
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Edition
2nd rev. ed.
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Publication
Elsevier
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Publication Year
1993
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Collation
376 p. ill. 25 cm
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Series
Materials science monographs
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Notes
Translation of: Litografick�e techniky , Includes bibliographical references and index
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Subject
Semiconductors , Integrated circuits , Microlithography. , X-ray lithography. , Lithography, Electron beam.
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ADDED ENTRIES
Kr�al�i�cek, Jaroslav. , Zachoval, Jarom�ir.
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Link To Document :
